3D Dynamic na Focus System

  • 3D Dynamic na Focus System – FR30-C

    3D Dynamic na Focus System – FR30-C

    3-axis deflection units

    suporta sa wavelength: 10640nm, 10200nm, 9400nm

    XY2-100 protocol

    larangan ng trabaho: 300*300mm hanggang 1600*1600mm

    pagproseso ng malalaking patlang ng pagtatrabaho na may maliit na lugar

     

  • 3D Dynamic na Focus System – FR30-F

    3D Dynamic na Focus System – FR30-F

    3-axis deflection units

    suporta ng wavelength: 1064nm

    XY2-100 protocol

    curved surface marking version at large field marking version para sa mga opsyon

    pagproseso ng malalaking patlang ng pagtatrabaho na may maliit na lugar

     

     

  • 3D Dynamic na Focus System FR20-F

    3D Dynamic na Focus System FR20-F

    3-axis deflection units

    suporta ng wavelength: 1064nm

    XY2-100 protocol

    larangan ng trabaho: 100*100mm hanggang 600*600mm

    Malaking field marking, 3D marking, curved surface etching, PCB marking

     

  • 3D Dynamic na Focus System – FR70-C

    3D Dynamic na Focus System – FR70-C

    3-axis deflection units

    suporta sa wavelength: 10640nm, 10200nm, 9400nm

    XY2-100 protocol

    pagproseso ng malalaking patlang ng pagtatrabaho na may maliit na lugar

    high-end na application sa industriya, sobrang pagganap

    maximum na 2000*2000mm work field

    0.12@3508350mm@10640nm

    0.64@2000x2000mm@10640nm

    sobrang laki ng pagmamarka ng lugar

    roll to roll na pagmamarka ng balat

  • 3D Dynamic na Focus System – FR40-F

    3D Dynamic na Focus System – FR40-F

    3-axis deflection units

    suporta ng wavelength: 1064nm

    XY2-100 protocol

    pagproseso ng malalaking patlang ng pagtatrabaho na may maliit na lugar

    Kumpara sa FR30-F, 30% mas pinong kalidad ng focal spot

  • 3D Dynamic na Focus System – FR40-C

    3D Dynamic na Focus System – FR40-C

    3-axis deflection units

    suporta sa wavelength: 10640nm.10200nm,9400nm

    XY2-100 protocol

    curved surface marking version at large field marking version para sa mga opsyon

    pagproseso ng malalaking patlang ng pagtatrabaho na may maliit na lugar

    Katumbas ng bilis ng FR30-C, 30% mas pinong kalidad ng focal spot

    laser filming, die cutting

  • 3D Dynamic na Focus System – FR20-U

    3D Dynamic na Focus System – FR20-U

    3-axis deflection units

    suporta sa wavelength: 355nm

    XY2-100 protocol

    larangan ng trabaho: 100*100mm hanggang 600*600mm

    Malaking field marking,3D marking, curved surface etching, precision marking

     

     

  • 3D Dynamic na Focus System – FR20-G

    3D Dynamic na Focus System – FR20-G

    3-axis deflection units

    suporta ng wavelength: 532nm

    XY2-100 protocol

    larangan ng trabaho: 100*100mm hanggang 600*600mm

    Malaking field marking,3D marking, curved surface etching, precision marking

  • 3D Dynamic na Focus System FR15-F

    3D Dynamic na Focus System FR15-F

    3-axis deflection units

    suporta ng wavelength: 1064nm

    XY2-100 protocol

    3D printing, Additive manufacturing

     

  • 3D Dynamic na Focus System一FR10-U

    3D Dynamic na Focus System一FR10-U

    3-axis deflection units

    suporta sa wavelength: 355nm

    XY2-100 protocol

    larangan ng trabaho: 100*100mm hanggang 600*600mm

    Malaking field marking, 3D marking, curved surface etching, PCB marking

     

     

  • 3D Dynamic na Focus System – FR10-G

    3D Dynamic na Focus System – FR10-G

    3-axis deflection units

    suporta ng wavelength: 532nm

    XY2-100 protocol

    larangan ng trabaho: 100*100mm hanggang 600*600mm

    Malaking field marking, 3D marking, curved surface etching

     

  • 3D Dynamic na Focus System一FR10-F

    3D Dynamic na Focus System一FR10-F

    3-axis deflection units

    suporta ng wavelength: 1064nm

    XY2-100 protocol

    larangan ng trabaho: 100*100mm at 200*200mm

    pagmamarka ng fiber laser, 3D laser engraving, laser etching